Radiation source module and lithographic apparatus

A lithographic apparatus comprising:

• a radiation source comprising:
• a fuel supply device configured to supply fuel;
• an excitation device configured to excite the fuel into a plasma;
• a collector configured to collect radiation emitted by the plasma and to direct the radiation to a beam exit;
• a debris mitigation system configured to collect debris generated by the plasma, the debris mitigation system having a first component having a first conduit passing therethrough and a second component having a second conduit passing therethrough;
• and
• a temperature control system configured to selectively increase or decrease respective temperatures of the first component and the second component by selectively heating or cooling a thermal transfer fluid circulating through the respective conduit, the temperature control system being operative to cool the first component to a first temperature that is below the melting point of the fuel and to heat the second component to a second temperature that is above the melting point of the fuel;
• an illumination system configured to illuminate a patterning device with radiation from the radiation source;
• and
• a projection system arranged to project a pattern from the patterning device onto a substrate.

A radiation source comprising:

• a fuel supply device configured to supply fuel;
• an excitation device configured to excite the fuel into a plasma;
• a collector configured to collect radiation emitted by the plasma and to direct the radiation to a beam exit;
• a debris mitigation system configured to collect debris generated by the plasma, the debris mitigation system having a component having a conduit passing therethrough;
• and
• a temperature control system configured to selectively increase or decrease the temperature of the component by selectively heating or cooling a thermal transfer fluid circulating through the conduit.