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AssigneeApplied Materials, Inc.
InventorsYaoling Pan, Patrick John Tae, Michael D. Willwerth, Leonard Tedeschi, Kiyki-Shiy N Shang, Mikhail V. Taraboukhine, Charles R. Hardy, Sivasankar Nagarajan
Estimating the term…
Capacitive sensors and capacitive sensing data integration for plasma chamber condition monitoring are described. In an example, a plasma chamber monitoring system includes a plurality of capacitive sensors, a capacitance digital converter, and an applied process server coupled to the capacitance digital converter, the applied process server including a system software. The capacitance digital converter includes an isolation interface coupled to the plurality of capacitive sensors, a power supply coupled to the isolation interface, a field-programmable gate-array firmware coupled to the isolation interface, and an application-specific integrated circuit coupled to the field-programmable gate-array firmware.
An interconnect for a plasma chamber monitoring system, the interconnect comprising:
A system, comprising:
Dependencies are inferred from the claim text.