Imprint apparatus, pattern forming method, and method of manufacturing semiconductor device

An imprint apparatus comprising:

• a chuck including a temperature controller configured to adjust a temperature of a substrate having a shot region, the chuck being configured to hold the substrate;
• a template stage configured to hold a template so that a surface of the template with a pattern faces the substrate, and configured to change a relative position of the substrate to the template in a vertical direction;
• and
• a controller configured to control the chuck and the template stage,
• wherein the controller is configured to calculate a magnification error between the pattern and the shot region, control the temperature controller such that the temperature of the substrate is adjusted based on the calculated magnification error, and
• control the template stage such that the pattern of the template is transferred to the shot region of the substrate after the temperature of the substrate is adjusted.