Device and method for depositing thick metal nitride coatings by the supercritical fluid route

A device for depositing a metal nitride with a thickness greater than or equal to 1 μm on a sample by supercritical fluids comprising:

• a first enclosure delimited by external walls forming a first closed volume;
• a second enclosure delimited by internal walls forming a second closed volume, the second enclosure being placed in the first enclosure and being intended to contain a fluid under supercritical conditions and the material of the internal walls being transparent to electromagnetic radiation;
• a heat transfer dielectric fluid circulating in the first closed volume around the second enclosure;
• a sample holder present in the second closed volume and configured to support the sample;
• an induction heating device placed in the first enclosure and surrounding the second enclosure so as to be able to heat the sample placed on the sample holder;
• an inlet configured to introduce a fluid into the second closed volume;
• an inlet configured to introduce at least one precursor material into the second closed volume;
• and
• at least one outlet configured to purge the second closed volume.