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US 12,492,815 B2Granted
Apparatus and process for oxidant formation
AssigneeAir Products and Chemicals, Inc.
InventorsKai Kang, Xiaoyi He, Eugene S Genkin
Life of this patent
Estimating the term…
Abstract
An apparatus and process for oxidant formation can be configured to facilitate improved mixing of for formation of an oxidant. Embodiments can be configured so conduits having a relatively large aspect ratio (e.g., 1.5 to 5 or 1.5 to over 5) can be utilized for improved gas mixing even in situations in which the carrier gas is at a relatively low pressure. Embodiments can also facilitate low nitrogen oxide formation combustion. Some embodiments can additionally provide improved carbon capture.
Claims11
An apparatus for oxidant formation comprising:
- a mixing device positionable and configured to receive a carrier gas from at least one source of gas and/or flue gas recycled from a combustion device, the mixing device also positionable and configured to receive oxygen from a source of oxygen for injecting the oxygen into the carrier gas to form an oxidant for feeding to the combustion device;
- the mixing device comprising a plurality of injection devices positioned within a conduit of the mixing device, the injection devices positionable downstream of at least one flow conditioning device such that the carrier gas is passable through the at least one flow conditioning device before passing along the injection devices;
- and
- the injection devices are positioned and configured to inject the oxygen into the carrier gas to form the oxidant;
- wherein the injection devices comprise a central region of injection devices, a first outer region of injection devices positioned between the central region of the injection devices and a first sidewall of the conduit and a second outer region of injection devices positioned between the central region of the injection devices and a second sidewall of the conduit;
- wherein the central region of injection devices are positioned between the first outer region of injection devices and the second outer region of injection devices;
- each of the injection devices of the central region of injection devices is configured to inject a mass flow rate of oxygen into the carrier gas via a central region injection rate,
- each of the injection devices of the first outer region of injection devices is configured to inject a mass flow rate of oxygen into the carrier gas via an outer region injection rate,
- each of the injection devices of the second outer region of injection devices is configured to inject a mass flow rate of oxygen into the carrier gas via the outer region injection rate, and
- the central region injection rate being at least 10% greater than the outer region injection rate.
7 more elements
Dependencies are inferred from the claim text.