Fast beam calibration procedure for beamline ion implanter
AssigneeApplied Materials, Inc.
InventorsGeorge M. Gammel, Eric Donald Wilson
Life of this patent
Estimating the term…
Abstract
A method includes receiving a spot beam profile is received for a spot ion beam; receiving a linear scanned beam profile for the spot ion beam; generating a calculated calibration spot profile, based upon the spot beam profile and the linear scanned beam profile; and implementing an adjusted scanned profile for the spot ion beam, based upon the calculated calibration spot profile.
Claims19
A method, comprising:
- receiving a spot beam profile for a spot ion beam;
- receiving a linear scanned beam profile for the spot ion beam;
- generating a calculated calibration spot profile, based upon the spot beam profile and the linear scanned beam profile;
- and
- implementing an adjusted scanned profile for the spot ion beam, based upon the calculated calibration spot profile,
- wherein the adjusted scanned profile is obtained by:
- generating, based on the calculated calibration spot profile, a scanned waveform for the spot ion beam with scan speed adjustments to vary scan speed along a horizontal beam scan axis;
- measuring, with a mechanical profile detector, beam current density of the scanned waveform along the horizontal beam scan axis;
- and
- determining the measured beam current density to be below a beam current uniformity specification limit.
An apparatus for controlling scanning of an ion beam, comprising:
- a beam scanner to scan a spot ion beam with respect to a substrate;
- a detector, to measure current of the spot ion beam;
- and
- a beam calibration component, comprising a controller and a memory, the memory comprising a calibration routine, operative on the controller to
- receive a spot beam profile for the spot ion beam;
- receive a linear scanned beam profile of the spot ion beam;
- generate a calculated calibration spot profile, based upon the spot beam profile and the linear scanned beam profile;
- and
- implement an adjusted scanned profile for the spot ion beam, based upon the calculated calibration spot profile,
- wherein the adjusted scanned profile is obtained by:
- generating, based on the calculated calibration spot profile, a scanned waveform for the spot ion beam with scan speed adjustments to vary scan speed along a horizontal beam scan axis;
- measuring, with a mechanical profile detector, beam current density of the scanned waveform along the horizontal beam scan axis;
- and
- determining the measured beam current density to be below a beam current uniformity specification limit.
A non-transitory computer-readable storage medium including instructions that when executed by a computer, cause the computer to:
- receive a spot beam profile for a spot ion beam;
- receive a linear scanned beam profile of the spot ion beam;
- generate a calculated calibration spot profile, based upon the spot beam profile and the linear scanned beam profile;
- and
- implement an adjusted scanned profile for the spot ion beam, based upon the calculated calibration spot profile,
- wherein the adjusted scanned profile is obtained by:
- generating, based on the calculated calibration spot profile, a scanned waveform for the spot ion beam with scan speed adjustments to vary scan speed along a horizontal beam scan axis;
- measuring, with a mechanical profile detector, beam current density of the scanned waveform along the horizontal beam scan axis;
- and
- determining the measured beam current density to be below a beam current uniformity specification limit.
Dependencies are inferred from the claim text.