Oxide thin film
AssigneeVanam Inc.
InventorsSoo Deok Han, Won Young Choi
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Abstract
The present technology relates to an oxide thin film. The oxide thin film of the present technology may include a single crystal substrate; and a main oxide layer laminated on the single crystal substrate and doped with dissimilar metal elements, wherein in energy-dispersive X-ray spectroscopy (EDX) using a transmission electron microscope (TEM), the dissimilar metal elements and metal elements of a metal oxide constituting the main oxide layer may be uniformly distributed. The present technology may provide an oxide thin film showing MIT characteristics of improved reliability, sensitivity, accuracy, and reproducibility.
Claims4
An oxide thin film comprising:
- a single crystal substrate;
- and
- a VO2 layer laminated on the single crystal substrate and doped with Ti,
- wherein a VO2 XRD peak of the VO2 layer does not appear in a range of 2θ=20° to 60°, but appears only in a range of 2θ=60° to 70°.
Dependencies are inferred from the claim text.