Method for forming protective film, method for manufacturing patterned substrate, and composition
AssigneeJsr Corporation
InventorsKazunori Takanashi, Hiroyuki Miyauchi, Nao Okumura, Tomoharu Kawazu, Satoshi Dei
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Abstract
A method for forming a protective film includes directly or indirectly coating only a periphery of a substrate with a composition. The composition includes a compound having an aromatic ring, and a solvent. The solvent includes a first solvent having a normal boiling point of 156° C. or higher and lower than 300° C. A content of the first solvent in the solvent is preferably 20 mass % or more and 100 mass % or less. The first solvent is preferably an ester, an alcohol, an ether, a carbonate, or a combination of two or more of an ester, an alcohol, an ether, and a carbonate.
Claims24
A method for producing a patterned substrate, comprising:
- directly or indirectly coating only a periphery of a substrate with a composition to form a protective film;
- directly or indirectly forming a resist pattern on the substrate having the protective film;
- and
- performing etching using the resist pattern as a mask,
- wherein the composition comprises:
- at least one compound selected from the group consisting of a novolac resin, a compound having a fluorenebisphenol skeleton, a compound having a spiroindene skeleton, a compound having a truxene skeleton, and a compound having a triphenylbenzene skeleton;
- and
- a solvent,
- the solvent comprising a first solvent having a normal boiling point of 156° C. or higher and lower than 300° C.
A method for producing a patterned substrate, comprising:
- directly or indirectly coating only a periphery of a substrate with a composition to form a protective film;
- directly or indirectly forming a resist pattern on the substrate having the protective film;
- and
- performing etching using the resist pattern as a mask,
- wherein the composition comprises:
- at least one compound selected from the group consisting of a novolac resin, a compound having a fluorenebisphenol skeleton, a compound having a spiroindene skeleton, a compound having a truxene skeleton, and a compound having a triphenylbenzene skeleton;
- and
- a solvent,
- the solvent comprising:
- a first solvent which has a normal boiling point of 205° C. or higher and is at least one solvent selected from the group consisting of a dialkylene glycol monoalkyl ether acetate and a carbonate;
- and a second solvent which has a normal boiling point of lower than 156° C. and is at least one solvent selected from the group consisting of an alkylene glycol monoalkyl ether and an alkylene glycol monoalkyl ether acetate,
- a content of the first solvent in the solvent being 40 mass % or more and 60 mass % or less with respect to a total mass of the solvent, and a content of the second solvent is 30 mass % or more and 60 mass % or less with respect to a total mass of the solvent.
Dependencies are inferred from the claim text.