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US 12,286,503 B2Granted
Brush polymer terminated with phosphonate for DSA
AssigneeMerck Patent GmbH
InventorsEunJeong Jeong, Durairaj Baskaran, Jihoon Kim
Life of this patent
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Abstract
The disclosed subject matter relates compounds of structure (I), and polymers of structure (II) having a polydispersity ranging from 1 to about 1.1, compositions comprising said polymers and a spin casting solvent, the process of forming a pinning layer selectively on metal with said composition and the process of using said pinning layers to affect chemoepitaxy directed self-assembly of an overlying block copolymer, and the subsequent process of pattern transfer of this self-assembled layer into a substrate by etching.
Claims24
A polymer of structure (II), wherein
- R1 is H, a C-1 to C-8 linear alkyl, a C-3 to C-8 branched alkyl, a C-3 to C-8 cyclic alkyl, an aryl, or an alkylenearyl;
- R2 is H, a halide, a C-1 to C-8 linear alkyl, a C-3 to C-8 branched alkyl, a C-3 to C-8 cyclic alkyl, a C-1 to C-8 linear alkyloxy, a C-3 to C-8 branched alkyloxy, a C-3 to C-8 cyclic alkyloxy, or —P(═O)(R3)(R4);
- R3 and R4 are independently an aryl, an alkylenearyl, a C-2 to C-8 alkyleneoxyalkyl, a C-2 to C-8 haloalkyl, a C-1 to C-8 linear alkyl, a C-3 to C-8 branched alkyl, a C-3 to C-8 cyclic alkyl, a C-1 to C-8 linear alkyloxy, a C-3 to C-8 branched alkyloxy or a C-3 to C-8 cyclic alkyloxy;
- L1 and L2 are independently a direct valence bond, or a C-1 to C-8 alkylene spacer group;
- B is a direct valence bond, or a methylene spacer (—CH2—)
- A is a styrenic polymer chain, or an acrylic polymer chain;
- and said polymer has a polydispersity ranging from 1 to 1.1;
4 more elements
Dependencies are inferred from the claim text.