Method for manufacturing structure
AssigneeSumitomo Chemical Company, Limited
InventorsFumimasa Horikiri, Noboru Fukuhara
Life of this patent
Estimating the term…
Abstract
There is provided a method for manufacturing a structure, including: applying a first etching to a surface of a member, at least the surface being composed of Group III nitride; and applying a second etching to the surface to which the first etching has been applied, wherein in applying the first etching, a flat portion and a protruding portion are formed, the flat portion being newly appeared on the surface by etching, and the protruding portion being raised with respect to the flat portion, which is caused by being less likely to be etched than the flat portion, and in applying the second etching, the protruding portion is lowered by etching the protruding portion.
Claims16
A method for manufacturing a structure, comprising:
- applying a first etching to a surface of a member, at least the surface being composed of Group III nitride;
- and
- applying a second etching to the surface to which the first etching has been applied,
- wherein in applying the first etching, a flat portion and a protruding portion are formed, the flat portion being newly appeared on the surface by etching, and the protruding portion being raised with respect to the flat portion, which is caused by being less likely to be etched than the flat portion, and
- in applying the second etching, the protruding portion is lowered by etching the protruding portion, and
- wherein the first etching is photoelectrochemical etching, the second etching is not photoelectrochemical etching, and the surface is not irradiated with ultraviolet light in the second etching.
Dependencies are inferred from the claim text.