Array substrate and fabrication method thereof, display panel

A method for fabricating an array substrate, comprising:

• forming a reflective electrode layer on a substrate;
• forming an anti-reflection layer and a pixel defining layer on a side of the reflective electrode layer away from the substrate, wherein the anti-reflection layer is configured to absorb light from outside and is formed between the reflective electrode layer and the pixel defining layer;
• an orthographic projection of the reflective electrode layer on the substrate overlaps with an orthographic projection of the pixel defining layer on the substrate;
• an orthographic projection of the anti-reflection layer on the substrate is within an overlapping portion between the orthographic projection of the reflective electrode layer on the substrate and the orthographic projection of the pixel defining layer on the substrate;
• and
• forming a black matrix on a side of the pixel defining layer away from the substrate, wherein an orthographic projection of at least a portion of the anti-reflection layer on the substrate does not overlap with an orthographic projection of the black matrix on the substrate,
• wherein the method further comprises forming a first protective layer on the side of the reflective electrode layer away from the substrate, wherein the first protective layer and the anti-reflection layer are formed from a same black metal oxide layer, and a light transmittance of a portion of the black metal oxide layer serving as the first protective layer is greater than a light transmittance of a portion of the black metal oxide layer serving as the anti-reflection layer.