Image display device manufacturing method and image display device

A method of manufacturing an image display device, the method comprising:

• providing a semiconductor growth substrate comprising a semiconductor layer, wherein the semiconductor layer comprises a light-emitting layer and is grown on a crystal growth substrate;
• providing a circuit substrate comprising:
• a circuit element located on a light-transmitting substrate,
• a first wiring layer located on the circuit element, and
• a first insulating film covering the circuit element and the first wiring layer;
• forming a first metal layer that is located on the first insulating film and is electrically connected to the first wiring layer;
• bonding the semiconductor growth substrate to the circuit substrate and electrically connecting the first metal layer to the semiconductor layer;
• etching the semiconductor layer to form a light-emitting element;
• etching the first metal layer to form a plug electrically connected to the light-emitting element;
• forming a second insulating film covering the plug, the light-emitting element, and the first insulating film;
• removing a portion of the second insulating film to expose a light-emitting surface at a side opposite to a surface of the light-emitting element on a first insulating film side;
• and
• forming a second wiring layer electrically connected to the light-emitting surface.