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US 12,224,200 B2Granted
Substrate treating apparatus
AssigneeSemes Co., Ltd.
InventorsJi Hoon Jeong, Won-Geun Kim, Young Dae Chung, Jee Young Lee, Tae Shin Kim
Life of this patent
Estimating the term…
Abstract
The present disclosure provides a substrate treating apparatus. The substrate treating apparatus includes a support unit that supports a substrate, and a heating unit that irradiates a beam to the substrate and heat the substrate, and the heating unit further includes an irradiation part that irradiates the beam, and a rotation part that rotates the beam.
Claims16
A substrate treating apparatus comprising:
- a support unit configured to support a substrate;
- and
- a heating unit configured to irradiate a beam to the substrate and heat the substrate,
- wherein the heating unit further includes:
- an irradiation part configured to irradiate the beam;
- and
- a rotation part configured to rotate the beam and including a pair of cylindrical lenses located on a travel path of the beam irradiated by the irradiation part;
- wherein the pair of cylindrical lenses are configured to be rotatable and rotational directions of the pair of cylindrical lenses are the same;
- wherein the support unit and the heating unit are arranged on the same side with respect to the substrate.
6 more elements
A substrate treating apparatus comprising:
- a support unit configured to support a substrate and optionally rotate the substrate;
- a liquid supply unit configured to supply a treatment liquid to the substrate;
- and
- a heating unit configured to irradiate a beam to the substrate and heat the substrate, and
- wherein the heating unit includes:
- an irradiation part configured to irradiate the beam;
- and
- a rotation part configured to rotate the beam and including a pair of cylindrical lenses located on a travel path of the beam irradiated by the irradiation part;
- wherein the pair of cylindrical lenses are configured to be rotatable and rotational directions of the pair of cylindrical lenses are the same;
- wherein the support unit and the heating unit are arranged on the same side with respect to the substrate.
7 more elements
A substrate treating apparatus comprising:
- a support member configured to support a substrate and formed of a transparent material;
- and
- a heating unit configured to heat the substrate by irradiating a laser beam to a lower surface of the substrate supported by the support member,
- wherein the heating unit includes:
- an irradiation part configured to irradiate the laser beam;
- and
- a rotation part configured to rotate the laser beam, and
- wherein the rotation part includes:
- a cylindrical lens located on a travel path of the laser beam irradiated by the irradiation part and configured to be rotatable.
6 more elements
Dependencies are inferred from the claim text.