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US 12,224,163 B2Granted
Ion beam source, substrate process apparatus including the same, and method of processing a substrate using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsSeungWan Yoo, Jeongyeon Lee, Dohyung Kim, Jaehong Park, Dong-Chan Lim
Life of this patent
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Abstract
An ion beam source including a plasma chamber including a plasma generating space, a plasma generator configured to generate plasma in the plasma generating space, a first grid connected to the plasma chamber, a second grid connected to the plasma chamber, and a first grid driver connected to the first grid. The first grid driver may be configured to move the first grid relative to the second grid.
Claims20
An ion beam source, comprising:
- a plasma chamber comprising a plasma generating space;
- a plasma generator configured to generate plasma in the plasma generating space;
- a first grid connected to the plasma chamber;
- a second grid connected to the plasma chamber;
- and
- a first grid driver connected to the first grid,
- wherein the first grid driver is configured to move the first grid relative to the second grid.
4 more elements
A substrate process apparatus, comprising:
- an ion beam source;
- and
- a substrate holder spaced apart from the ion beam source,
- wherein the ion beam source comprises:
- a plasma chamber comprising a plasma generating space;
- a plasma generator configured to generate plasma in the plasma generating space;
- a plurality of grids connected to the plasma chamber;
- and
- a grid driver configured to move one of the plurality of grids relative to the other ones of the plurality of grids.
6 more elements
A substrate processing method, comprising:
- placing a substrate in a substrate process apparatus;
- and
- emitting an ion beam from an ion beam source spaced apart from the substrate,
- wherein the ion beam source comprises:
- a plasma chamber providing a plasma generating space;
- a plasma generator configured to generate plasma in the plasma generating space;
- a first grid connected to the plasma chamber;
- a second grid connected to the plasma chamber;
- and
- a first grid driver connected to the first grid,
- wherein the first grid driver is configured to move the first grid relative to the second grid.
8 more elements
Dependencies are inferred from the claim text.