Method for determining aberration sensitivity of patterns

A computer program product comprising a non-transitory computer readable medium having instructions therein, the instructions, when executed by a computer system, configured to cause the computer system to at least:

• obtain (i) a first set of kernels and a second set of kernels associated with an aberration wavefront of a patterning apparatus, and (ii) a design layout to be printed on a substrate via the patterning apparatus;
• determine, via a process simulation using the design layout, via the first set of kernels, and via the second set of kernels, an aberration sensitivity map associated with the aberration wavefront, the aberration sensitivity map indicating how sensitive one or more portions of the design layout are to a particular aberration and an interaction between different aberrations;
• and
• determine, based on the aberration sensitivity map, a process window limiting pattern associated with the design layout having relatively high sensitivity compared to other portions of the design layout.