Salt, acid generator, resist composition and method for producing resist pattern

A salt represented by formula (I):

• wherein, in formula (I),
• Q1 and Q2 each independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms,
• R11 and R12 each independently represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms,
• z represents 0,
• X1 and X2 each independently represent *—CO—O—, *—O—CO—, *—O—CO—O— or *—O—, and represents a bonding site to C(R11)(R12) or C(Q1)(Q2) or A1 or L2,
• L1 represents a single bond or a hydrocarbon group having 1 to 28 carbon atoms which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —SO2— or —CO—,
• A1 represents a group having a lactone structure which may have a substituent,
• L2 and L3 each independently represent a single bond or an alkanediyl group having 1 to 6 carbon atoms,
• R1 represents an iodine atom or a haloalkyl group having 1 to 12 carbon atoms,
• one of R2 represents a halogen atom, and the other of R2 represents a hydroxy group,
• m2 is 2, and
• Z+ represents an organic cation.