Polypeptide, photoresist composition including the same, and method of forming pattern using the same

A polypeptide comprising a region A, a region B, and a region H;

• wherein:
• the region A has an alanine content of 20% or more, and includes at least one first repeat unit having 4 to 6 consecutive amino acid residues, wherein the first repeat unit is represented by Formula 1:
• X11-(Ala-X12)n11—X13;
• Formula 1
• wherein X11 and X12 are each independently Gly or Ala,
• X13 is Ser, and
• n11 is 1 or 2;
• the region B has a tyrosine content of 10% or more, a content of 5% or more of at least one of serine, threonine, asparagine, or glutamine, and includes at least one second repeat unit including 4 to 8 consecutive amino acid residues, wherein the second repeat unit is represented by Formula 2:
• X21—(X22—X23)n21—(X24—X25)n22-Tyr;
• Formula 2
• wherein X21 and X23 are each Gly,
• X22 and X24 are each independently Ala or Val,
• X25 is Ser, Thr, Asn, or Gln,
• n21 is an integer of 0 to 2, and
• n22 is 1;
• and
• the region H comprises Gly-Ala-Ala-Ser (SEQ ID NO:
• 8);
• wherein the polypeptide has a molecular weight of 10,000 g/mol or less.