Method of forming an enhanced unexposed photoresist layer
AssigneeASM IP Holding B.V.
InventorsJan Willem Maes, Krzysztof Kamil Kachel, David Kurt de Roest
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Abstract
The method relates to a method of forming an enhanced unexposed photoresist layer from an unexposed photoresist layer on a substrate by increasing the sensitivity of the unexposed photoresist to exposure radiation. The method comprises: providing the substrate with the unexposed photoresist layer in a reaction chamber; providing a first precursor comprising a portion of a photosensitizer sensitive to exposure radiation in the reaction chamber; and, infiltrating the unexposed photoresist layer on the substrate with the first precursor.
Claims18
A system for forming an enhanced unexposed photoresist layer with an increased sensitivity to exposure radiation, the system comprising:
- a reactor comprising a first reaction chamber, a substrate holder, and a gas distribution system;
- a temperature control system;
- and
- a pressure control system,
- wherein the system is configured to:
- receive a substrate with the unexposed photoresist layer in the first reaction chamber;
- and,
- provide a first precursor comprising at least a portion of a photosensitizer sensitive to exposure radiation to the substrate in the first reaction chamber and retain the first precursor within in the first reaction chamber for a soaking period thereby infiltrating the unexposed photoresist layer on the substrate with the first precursor for a first period T1.
Dependencies are inferred from the claim text.