Semiconductor device inspection method and semiconductor device inspection apparatus

A semiconductor device inspection device, comprising:

• a measuring device configured to supply power to a semiconductor device and measure electrical characteristics of the semiconductor device according to the supply of the power;
• an optical scanner configured to scan the semiconductor device with light intensity-modulated with a first frequency and light intensity-modulated with a second frequency higher than the first frequency;
• a signal acquisition device configured to acquire a characteristic signal indicating the electrical characteristics of the first frequency component and the second frequency component according to the scanning of the light;
• and
• a processor configured to process the characteristic signal,
• wherein the processor calculates a frequency of the characteristic signal at which the characteristic signal at a first scanning position reflecting the electrical characteristics of a first position in an optical axis direction of the light in the semiconductor device and the characteristic signal at a second scanning position reflecting the electrical characteristics of a second position in the optical axis direction of the light in the semiconductor device have a predetermined phase difference, corrects a phase component of the characteristic signal at an arbitrary scanning position with a phase component of the characteristic signal at the first scanning position in the semiconductor device as a reference, acquires the characteristic signal at the arbitrary scanning position at the calculated frequency, and outputs an in-phase component and a quadrature component of the characteristic signal.