Thin film sensor and manufacturing method thereof

A manufacturing method of a thin film sensor, comprising:

• forming a plurality of conductive wires intersecting each other and a functional structure on a base substrate;
• wherein the functional structure is configured to allow at least part of light, which is transmitted along a preset direction and enters the functional structure from regions where the conductive wires are located, to exit from hollow-out parts defined by the conductive wires, and the preset direction is a direction from the base substrate towards the conductive wires, wherein
• the functional structure comprises a first medium layer disposed on the base substrate, the forming the functional structure comprises forming the first medium layer on the base substrate, and the forming the first medium layer comprises:
• forming a plurality of first main portions intersecting each other on a side of the conductive wires close to the base substrate, with an orthographic projection of each first main portion on the base substrate and an orthographic projection of the conductive wire to be formed and corresponding to the first main portion on the base substrate are the same in shape and coincide;
• and
• the manufacturing method further comprises:
• forming a pattern comprising a planarization layer on a side of the first medium layer away from the base substrate, wherein the first medium layer covers sidewalls of the first medium layer and a refractive index of the first medium layer is less than that of the planarization layer.

A manufacturing method of a thin film sensor, comprising:

• forming a plurality of conductive wires intersecting each other and a functional structure on a base substrate;
• wherein the functional structure is configured to allow at least part of light, which is transmitted along a preset direction and enters the functional structure from regions where the conductive wires are located, to exit from hollow-out parts defined by the conductive wires, and the preset direction is a direction from the base substrate towards the conductive wires, wherein the functional structure comprises:
• a first medium layer and a second medium layer on the base substrate;
• a refractive index of the first medium layer is less than that of the second medium layer;
• and the forming the functional structure comprises:
• forming the second medium layer on a side of the conductive wires close to the base substrate, wherein a plurality of first grooves intersecting each other are formed in the second medium layer;
• and
• forming the first medium layer, which comprises a plurality of first main portions intersecting each other, between the second medium layer and the conductive wires, wherein an orthographic projection of each first main portion on the base substrate and an orthographic projection of the conductive wire corresponding to the first main portion on the base substrate is the same in shape and coincide.