Semiconductor device
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShih-Cheng Chen, Chun-Hsiung Lin, Chih-Hao Wang
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShih-Cheng Chen, Chun-Hsiung Lin, Chih-Hao Wang
Estimating the term…
A device includes an active region, a gate structure, a source/drain epitaxial structure, an epitaxial layer, a metal alloy layer, a contact, and a contact etch stop layer. The gate structure is across the active region. The source/drain epitaxial structure is over the active region and adjacent the gate structure. The epitaxial layer is over the source/drain epitaxial structure. The metal alloy layer is over the epitaxial layer. The contact is over the metal alloy layer. The contact etch stop layer lines sidewalls of the source/drain epitaxial structure. The metal alloy layer is spaced apart from the contact etch stop layer.
A device comprising:
A device comprising:
A device comprising:
Dependencies are inferred from the claim text.