Array substrate and manufacturing method thereof

An array substrate, comprising:

• a substrate, an active layer disposed on the substrate, a first insulating layer disposed on the substrate and the active layer, a first metal layer disposed on the first insulating layer, a second insulating layer disposed on the substrate, the active layer, the first insulating layer, and the first metal layer and covering the first insulating layer and the first metal layer, and a second metal layer disposed on the second insulating layer;
• wherein the array substrate has a TFT area, the first metal layer comprises a gate sub-layer located in the TFT area, the second metal layer comprises a source-drain metal sub-layer located in the TFT area, the TFT area comprises an active layer exposed area located between the gate sub-layer and the source-drain metal sub-layer, the array substrate further comprises a barrier layer located above the active layer, and an orthographic projection of the barrier layer on the active layer at least partially covers an orthographic projection of the active layer exposed area on the active layer;
• the barrier layer is disposed on the second insulating layer, and the barrier layer and the second metal layer are formed in a same process;
• the TFT area comprises a switching TFT sub-area, the gate sub-layer comprises a second gate located in the switching TFT sub-area, the source-drain metal sub-layer comprises a second source and a second drain located in the switching TFT sub-area, the active layer exposed area comprises a third exposed sub-area located between the second source and the second gate and a fourth exposed sub-area located between the second drain and the second gate, [and] the barrier layer comprises a second barrier sub-layer, and the active layer comprises a second active sub-layer located in the switching TFT sub-area;
• an orthographic projection of the second barrier sub-layer on the second active sub-layer at least partially covers an orthographic projection of the third exposed sub-area on the second active sub-layer;
• and/or the orthographic projection of the second barrier sub-layer on the second active sub-layer at least partially covers an orthographic projection of the fourth exposed sub-area on the second active sub-layer;
• the TFT area comprises a driving TFT sub-area, the gate sub-layer comprises a first gate located in the driving TFT sub-area, the source-drain metal sub-layer comprises a first source and a first drain located in the driving TFT sub-area, the active layer exposed area comprises a first exposed sub-area located between the first source and the first gate and a second exposed sub-area located between the first drain and the first gate, the barrier layer comprises a first barrier sub-layer, and the active layer comprises a first active sub-layer located in the driving TFT sub-area;
• an orthographic projection of the first barrier sub-layer on the first active sub-layer at least partially covers an orthographic projection of the first exposed sub-area on the first active sub-layer;
• and/or the orthographic projection of the first barrier sub-layer on the first active sub-layer at least partially covers an orthographic projection of the second exposed sub-area on the first active sub-layer;
• the first barrier sub-layer comprises a barrier body disposed above the first gate, a first branch extending from an end of the barrier body to the first exposed sub-area, and a second branch extending from another end of the barrier body to the second exposed sub-area, and an orthographic projection of the barrier body on the first active sub-layer completely covers an orthographic projection of the first gate on the first active sub-layer;
• and
• an end of the first branch away from the barrier body is connected to the first source, or an end of the second branch away from the barrier body is connected to the first drain.

A manufacturing method of an array substrate, comprising following steps:

• providing a substrate and forming an active layer on the substrate, wherein the array substrate comprises a TFT area;
• forming a first insulating layer on the substrate and the active layer and forming a first metal layer on the first insulating layer, wherein the first metal layer comprises a gate sub-layer formed in the TFT area;
• forming a second insulating layer on the substrate, the active layer, the first insulating layer, and the first metal layer and covering the first insulating layer and the first metal layer;
• forming a second metal layer on the second insulating layer, wherein the second metal layer comprises a source-drain metal sub-layer formed in the TFT area;
• and
• forming a barrier layer above the active layer, wherein the TFT area comprises an active layer exposed area located between the gate sub-layer and the source-drain metal sub-layer, and an orthographic projection of the barrier layer on the active layer at least partially covers an orthographic projection of the active layer exposed area on the active layer;
• wherein the barrier layer is disposed on the second insulating layer, and the barrier layer and the second metal layer are formed in a same process;
• the TFT area comprises a driving TFT sub-area, the gate sub-layer comprises a first gate located in the driving TFT sub-area, the source-drain metal sub-layer comprises a first source and a first drain located in the driving TFT sub-area, the active layer exposed area comprises a first exposed sub-area located between the first source and the first gate and a second exposed sub-area located between the first drain and the first gate, the barrier layer comprises a first barrier sub-layer, and the active layer comprises a first active sub-layer located in the driving TFT sub-area;
• an orthographic projection of the first barrier sub-layer on the first active sub-layer at least partially covers an orthographic projection of the first exposed sub-area on the first active sub-layer;
• and/or the orthographic projection of the first barrier sub-layer on the first active sub-layer at least partially covers an orthographic projection of the second exposed sub-area on the first active sub-layer;
• and
• the first barrier sub-layer comprises a barrier body disposed above the first gate, a first branch extending from an end of the barrier body to the first exposed sub-area, and a second branch extending from another end of the barrier body to the second exposed sub-area, and an orthographic projection of the barrier body on the first active sub-layer completely covers an orthographic projection of the first gate on the first active sub-layer.