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US 12,218,072 B2Granted
Semiconductor device and method for manufacturing the same
AssigneeKioxia Corporation
InventorsYoichi Mizuta, Takahiro Tsurudo, Yoshiaki Takahashi, Kenichi Matoba, Yoshifumi Shimamura, Toru Ozawa, Takumi Kosaki, Kouji Nakao
Life of this patent
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Abstract
According to one embodiment, a semiconductor device includes a circuit pattern including a plurality of unit patterns that are disposed in a repeating manner in at least one direction. The semiconductor device includes a discrimination pattern provided in the circuit pattern and configured to discriminate the unit patterns from each other.
Claims12
A semiconductor device comprising:
- a circuit pattern including a plurality of unit patterns that are disposed in a repeating manner in a first direction;
- and
- a discrimination pattern provided in the circuit pattern and configured to discriminate the plurality of unit patterns from each other,
- wherein the discrimination pattern has a corresponding one of a plurality of discrimination figures different from each other, and each of the plurality of discrimination figures corresponds to a respective one of the plurality of unit patterns,
- wherein the plurality of discrimination figures are arranged along a second direction, which is different from the first direction, and respective lengths of the plurality of discrimination figures in the second direction are different from each other.
2 more elements
Dependencies are inferred from the claim text.