Back to results
US 12,217,998 B2Granted
Substrate processing apparatus
AssigneeTokyo Electron Limited
InventorsJunnosuke Taguchi, Nobuhiro Takahashi
Life of this patent
Estimating the term…
Abstract
A substrate processing apparatus includes a vacuum chamber, a rotary table that is rotatably provided inside the vacuum chamber, a stage that is rotatable with respect to the rotary table, the stage having a center of rotation at a position spaced apart from a center of rotation of the rotary table, and the stage having a flange provided at a lower surface of the stage, a first holder and a second holder, the flange being sandwiched between the first holder and the second holder, and a pressing member configured to press the second holder in a direction in which the second holder comes closer to the first holder.
Claims16
An apparatus for substrate processing, the apparatus comprising:
- a vacuum chamber;
- a rotary table that is rotatably provided inside the vacuum chamber;
- a stage that is rotatable with respect to the rotary table, the stage having a center of rotation at a position spaced apart from a center of rotation of the rotary table, and the stage having a flange provided at a lower surface of the stage;
- a first holder and a second holder, the flange being sandwiched between the first holder and the second holder;
- a pressing member configured to press the second holder in a direction in which the second holder comes closer to the first holder, and
- a shaft that rotates the stage with respect to the rotary table,
- wherein an upper end of the first holder overlaps the flange in plan view,
- wherein the first holder has a first through-hole, the shaft has an insertion portion, and the insertion portion of the shaft passes through the first through-hole,
- wherein a first space is formed between an outer wall of the insertion portion and an inner wall of the first through-hole,
- wherein the inner wall of the first through-hole is exposed to the first space,
- wherein the second holder has a second through-hole, and the insertion portion of the shaft passes through the second through-hole,
- wherein a second space is formed between the outer wall of the insertion portion and an inner wall of the second through-hole,
- wherein the inner wall of the second through-hole is exposed to the second space,
- wherein the first holder has a cylindrical shape with a bottom, an upper end of the first holder contacting a lower surface of the flange, and
- wherein the second holder has a cylindrical shape with a bottom, the second holder being provided inside the first holder such that the second holder is spaced apart from an inner wall of the first holder, and the second holder including a contact contacting an upper surface of the flange.
12 more elements
An apparatus for substrate processing, the apparatus comprising:
- a vacuum chamber;
- a rotary table that is rotatably provided inside the vacuum chamber;
- the rotary table having a flange provided at a lower surface of the rotary table at a position spaced apart from a center of rotation of the rotary table;
- a first holder and a second holder, the flange being sandwiched between the first holder and the second holder;
- a pressing member configured to press the second holder in a direction in which the second holder comes closer to the first holder, and
- a fixing shaft that fixes the rotary table,
- wherein an upper end of the first holder overlaps the flange in plan view,
- wherein the first holder has a first through-hole, the fixing shaft has an insertion portion, and the insertion portion of the fixing shaft passes through the first through-hole,
- wherein a first space is formed between an outer wall of the insertion portion and an inner wall of the first through-hole,
- wherein the inner wall of the first through-hole is exposed to the first space,
- wherein the second holder has a second through-hole, and the insertion portion of the fixing shaft passes through the second through-hole,
- wherein a second space is formed between the outer wall of the insertion portion and an inner wall of the second through-hole,
- wherein the inner wall of the second through-hole is exposed to the second space,
- wherein the first holder has a cylindrical shape with a bottom, an upper end of the first holder contacting a lower surface of the flange, and
- wherein the second holder has a cylindrical shape with a bottom, the second holder being provided inside the first holder such that the second holder is spaced apart from an inner wall of the first holder, and the second holder including a contact contacting an upper surface of the flange.
12 more elements
Dependencies are inferred from the claim text.