Semiconductor apparatus and method of collecting residues

A semiconductor apparatus, comprising:

• a chamber containing a wafer cassette;
• and
• a collecting module disposed in the chamber for collecting residues of curable material, and the collecting module comprising:
• a flow-directing structure mounted on an upper portion of the chamber, the flow-directing structure comprising a central opening and a slanted surface sloped to direct the residues of curable material toward the central opening;
• a baffle ring mounted on a lower portion of the chamber;
• and
• a tray shielding the wafer cassette and being movable together with the wafer cassette between the flow-directing structure and the baffle ring.

A semiconductor apparatus, comprising:

• a chamber containing a wafer cassette;
• and
• a collecting module disposed in the chamber and comprising:
• a flow-directing structure disposed at a top side of the chamber, the flow-directing structure comprising a hollow region and a slanted surface, the slanted surface directing residues of curable material toward the hollow region;
• a tray disposed on the wafer cassette, the tray receiving the residues of the curable material dripping from the flow-directing structure;
• and
• a baffle ring disposed at a bottom side of the chamber.