Isolated volume seals and method of forming an isolated volume within a processing chamber

A substrate processing chamber comprising:

• an upper wall, and a bottom wall, a liner disposed between the upper wall and the bottom wall, and a containment member coupled to an internal surface of the liner, wherein the containment member has a lower sealing surface;
• a support chuck having a substrate supporting surface, and a bottom surface opposite the substrate supporting surface;
• a seal ring assembly coupled to the bottom surface of the support chuck configured to isolate a region above the seal ring assembly from a region below the support chuck;
• and
• a lift pin assembly comprising:
• a sealing member comprising:
• a central portion comprising an inside surface and an outside surface that is opposite to the inside surface;
• a first end of the central portion coupled to the bottom surface of the substrate support;
• a second end of the central portion coupled to a lower support, and
• a lift pin passing through the sealing member, wherein the lift pin is configured to support a substrate above the substrate support surface;
• a flange comprising;
• a top flange portion affixed to the lower portion of the substrate support;
• a bottom flange portion configured to abut the lower support and configured to prevent the lift pin from extending a distance below the substrate support surface.

A substrate processing chamber, the substrate processing chamber comprising:

• a substrate support moveable between a raised position, and a lowered position, the substrate support including a substrate support surface configured to receive a substrate;
• and
• a lift pin assembly comprising:
• an upper support coupled the substrate support;
• a lower support opposite the upper support;
• a sealing member disposed between the upper support and the lower support;
• a lift pin passing through the upper support, wherein the lift pin is configured to support a substrate above the substrate support surface;
• a flange comprising;
• a top flange portion affixed to the lower portion of the substrate support;
• a bottom flange portion configured to abut the lower support and configured to prevent the lift pin from extending a distance below the substrate support surface.

A substrate processing chamber configured to perform a process on a substrate, comprising:

• a first region;
• a second region;
• a substrate support moveable between a raised position and a lowered position, the substrate support including a substrate support surface disposed in the first region and configured to support a substrate during the performance of the process on the substrate;
• and
• a lift pin assembly comprising:
• a sealing member, comprising:
• a central portion comprising a compressible region, an inside surface, and an outside surface which is disposed on a side of the sealing member that is opposite to the inside surface;
• at least a portion of the first region being defined by the inside surface of the central portion of the sealing member;
• at least a portion of the second region being defined by at least the outside surface of the central portion of the sealing member;
• and
• a first end of the central portion coupled to the substrate support;
• and
• a lift pin configured to support a substrate above the substrate support surface, wherein
• the lift pin is disposed within the at least a portion of the first region, and within an opening formed in the substrate support;
• and
• the sealing member being configured to isolate the at least the portion of the first region from the second region during the performance of the process on the substrate.