Method and apparatus for treating substrate

A substrate treating method comprising:

• moving a treating container to a preset position in response to a treating process of a substrate treatment device;
• detecting, by a plurality of magnet detectors arranged at a plurality of height positions of the treating container, respectively, a plurality of magnets provided at a plurality of elevation units, respectively, located at opposite sides of the treating container;
• determining whether the treating container is positioned at an abnormal position based on a result of the detecting of a position of the treating container to generate a first result;
• vision-testing a positional state of the treating container by comparing an image captured from an upper side of the treating container via a vision sensor to pre-stored normal state information for the preset position of the treating container;
• determining, after the determining that the treating container is positioned at the abnormal position, whether the treating container is position at a normal state based on a result of the vision-testing of the positional state of the treating container to generate a second result;
• determining one of whether to stop the treating process of the substrate and whether to operate the treating process of the substrate based on the first and second results, taking a follow-up action in response to the determining of whether to stop the treating process of the process or operate the treating process of the substrate based on the first and second results;
• stopping an operation of the substrate treatment device when the first result is determined as an abnormal position and the second result is determined as an abnormal state;
• proceeding the treating process of the substrate device having the first component which is moved to the preset position when the first result is determined as an abnormal position and the second result is determined as a normal state.