Chamber component condition estimation using substrate measurements
AssigneeApplied Materials, Inc.
InventorsChunlei Zhang, Zhaozhao Zhu, Michael Kutney
Life of this patent
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AssigneeApplied Materials, Inc.
InventorsChunlei Zhang, Zhaozhao Zhu, Michael Kutney
Estimating the term…
A substrate processing system includes a process chamber, one or more robot, a substrate measurement system, and a computing device. The process chamber may process a substrate that will comprise a film and/or feature after the processing. The one or more robot, to move the substrate from the process chamber to a substrate measurement system. The substrate measurement system may measure the film and/or feature on the substrate and generate a profile map of the film and/or feature. The computing device may process data from the profile map using a first trained machine learning model, wherein the first trained machine learning model outputs a first chamber component condition estimation for a first chamber component of the process chamber. The computing device may then determine whether to perform maintenance on the first chamber component of the process chamber based at least in part on the first chamber component condition estimation.
A method, comprising:
A substrate processing system comprising:
A non-transitory computer readable medium comprising instructions that, when executed by a processing device, cause the processing device to perform operations comprising:
Dependencies are inferred from the claim text.