Gas manifold for simultaneous gas property control in deposition systems
AssigneeArradiance, Inc.
InventorsDavid R. Beaulieu, Jeffrey D. McHugh, Michael D. Trotter, Darith Kong
Life of this patent
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AssigneeArradiance, Inc.
InventorsDavid R. Beaulieu, Jeffrey D. McHugh, Michael D. Trotter, Darith Kong
Estimating the term…
A gas manifold includes a gas inlet surface having a first and second gas input port and a gas outlet surface. A first internal chamber is coupled to the first gas input port. A first plurality of gas conduits, each including an input coupled to the first internal chamber and an outlet at the gas outlet surface where a direction of at least one of the conduits in the first plurality of gas conduits relative to the gas outlet surface is different. A second internal chamber is coupled to the second gas input port and is isolated from the first internal chamber. A second plurality of gas conduits, each including an input coupled to the second internal chamber and an outlet at the gas outlet surface. A direction of at least one of the conduits in the second plurality of gas conduits relative to the gas outlet surface is different. Directions of at least some of the gas conduits in the first and second plurality of gas conduits relative to the gas outlet surface can be selected to provide a desired gas flow pattern proximate to the gas outlet surface.
A gas manifold comprising:
Dependencies are inferred from the claim text.