Systems and methods for pulse width modulated dose control
AssigneeLam Research Corporation
InventorMariusch Gregor
Life of this patent
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Abstract
A substrate processing system for treating a substrate includes N manifolds, Y groups of injector assemblies, and a dose controller, where Y and N are integers greater than one. Each of the Y groups of injector assemblies includes N injector assemblies located in a processing chamber. Each of the N injector assemblies in each group of injector assemblies is in fluid communication with one of the N manifolds, respectively, and includes a valve including an inlet and an outlet. The dose controller is configured to control pulse widths output to the Y groups of injector assemblies to provide temporal dosing of the substrate.
Claims13
A substrate processing system for treating a substrate, comprising:
- N manifolds;
- Y groups of injector assemblies, wherein Y and N are integers greater than one, wherein each of the Y groups of injector assemblies includes N injector assemblies located in a processing chamber, wherein each of the N injector assemblies in each group of injector assemblies is in fluid communication with one of the N manifolds, respectively, and includes a valve including an inlet and an outlet;
- and a dose controller configured to control pulse widths output to the Y groups of injector assemblies to provide temporal dosing of the substrate, wherein the dose controller is configured to vary the pulse widths based on at least one of manufacturing differences between the valves in at least one of the N injector assemblies and non-uniformities of the valves in at least one of the N injector assemblies.
Dependencies are inferred from the claim text.