Pedestal thermal profile tuning using multiple heated zones and thermal voids
AssigneeLam Research Corporation
InventorsGary B. Lind, Alok Mahadeva
Life of this patent
Estimating the term…
Abstract
A substrate support includes a body and a thermal void. The body is configured to support a substrate during processing of the substrate. The body includes plates including a top plate, a first intermediate plate, a second intermediate plate and a bottom plate. The plates are arranged to form a stack. The first intermediate plate is disposed on the second intermediate plate. The thermal void is defined by an upper surface of the second intermediate plate and at least one of a lower surface of the first intermediate plate or a lower surface of the top plate. The thermal void is annular-shaped.
Claims21
A substrate support comprising:
- a body configured to support a substrate during processing of the substrate, wherein the body comprises a plurality of plates comprising a top plate, a first intermediate plate, a second intermediate plate and a bottom plate, wherein the plurality of plates are arranged to form a stack, and wherein the first intermediate plate is disposed on the second intermediate plate;
- and
- a thermal void defined by an upper recessed surface of the second intermediate plate and at least one of a lower recessed surface of the first intermediate plate or a lower recessed surface of the top plate, wherein the thermal void is annular-shaped.
A substrate support comprising:
- a body configured to support a substrate during processing of the substrate, wherein the body comprises a plurality of plates comprising a top plate, a plurality of intermediate plates, and a bottom plate, and wherein the plurality of plates are arranged to form a stack;
- and
- a thermal void defined by the plurality of intermediate plates and extending into each of the plurality of intermediate plates, wherein the thermal void is annular-shaped and concentric with the two or more of the plurality of plates.
A substrate support comprising:
- a body configured to support a substrate during processing of the substrate, wherein the body comprises a plurality of plate layers comprising a top plate layer, one or more intermediate plate layers, a bottom plate layer, an annular channel, and a plurality of radially extending channels, wherein the one or more intermediate plate layers comprise a first plate and a second plate, wherein the second plate is concentric with the first plate, wherein the plurality of plate layers are arranged to form a stack, and wherein the annular channel and the plurality of radially extending channels extend at least partially within the one or more intermediate plate layers;
- and
- a thermal void defined at least partially by the first plate and the second plate, wherein the thermal void is annular-shaped,
- wherein the plurality of radially extending channels fluidically couple the annular channel to the thermal void.
Dependencies are inferred from the claim text.