Method for cleaning semiconductor process equipment and system thereof
OwnerChun-Jung Chiu, Chun-Hsiung Chen +1inventors
InventorsChun-Jung Chiu, Chun-Hsiung Chen, Wan-Chen Chuang
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Abstract
A method for cleaning semiconductor process equipment and a system thereof are provided. The method is adapted to apply to an object with at least one pollutant thereon and includes steps of providing multi-channel optical tweezers to irradiate the pollutant and locations where the pollutant is neighbor to, in order to let the optical tweezers generate a resultant force to the pollutant; and providing an airflow to the object. The resultant force is greater than a maximum static friction between the pollutant and the object so as to remove the pollutant.
Claims4
A method for cleaning semiconductor process equipment, adapted to apply to an object with at least one pollutant thereon, comprising steps of:
- providing multi-channel optical tweezers to irradiate a single one of the at least one pollutant and locations where the at least one pollutant is neighbor to, in order to let the optical tweezers generate a resultant force to the at least one pollutant;
- and
- providing an airflow to the object;
- wherein the resultant force is greater than a maximum static friction between the at least one pollutant and the object;
- and
- wherein the optical tweezers are applied from different directions.
Dependencies are inferred from the claim text.