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US 12,193,271 B2Granted
Display apparatus and method of manufacturing the same
AssigneeSamsung Display Co., Ltd.
InventorsDongmin Lee, Jaewoo Jeong, Janghyun Kim, Jongoh Seo, Byungsoo So
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Abstract
A display apparatus includes a substrate, a gate electrode overlapping the substrate, and a semiconductor layer positioned between the substrate and the gate electrode. The semiconductor layer includes a first layer and a second layer positioned between the first layer and the gate electrode. A hydrogen content of the first layer is greater than a hydrogen content of the second layer.
Claims13
A method for manufacturing a display apparatus, the method comprising:
- forming an amorphous silicon layer on a substrate;
- heat-treating the amorphous silicon layer to form a heat-treated amorphous silicon layer;
- doping the heat-treated amorphous silicon layer with hydrogen to form a hydrogen-doped amorphous silicon layer;
- and
- crystallizing the hydrogen-doped amorphous silicon layer into a polycrystalline silicon layer by irradiating a laser to the hydrogen-doped amorphous silicon layer,
- wherein the hydrogen-doped amorphous silicon layer includes a first portion and a second portion,
- wherein the first portion is positioned between the substrate and the second portion, and
- wherein a hydrogen content of the first portion is greater than a hydrogen content of the second portion.
5 more elements
Dependencies are inferred from the claim text.