Semiconductor device
AssigneeKioxia Corporation
InventorsTakatoshi Minamoto, Sho Tokairin, Yoshinao Suzuki
Life of this patent
Estimating the term…
Loading patent…
AssigneeKioxia Corporation
InventorsTakatoshi Minamoto, Sho Tokairin, Yoshinao Suzuki
Estimating the term…
A semiconductor device has a first conductivity type semiconductor substrate. A second conductivity type first impurity diffusion layer is disposed in a surface region of the semiconductor substrate. A resistance element is configured with a first conductivity type second impurity diffusion layer disposed in the first impurity diffusion layer in the surface region of the semiconductor substrate. In a transistor, a gate is connected to an input portion of the resistance element, a source is connected to the first impurity diffusion layer, and a drain is connected to a voltage source higher than the voltage of the input portion. A current source is connected to the source.
A semiconductor device comprising:
Dependencies are inferred from the claim text.