Array substrate fabricating method

A method of fabricating an array substrate, the array substrate comprising a display region and a non-display region, wherein the method comprises steps of:

• providing a substrate;
• depositing an oxide layer on the substrate and patterning the oxide layer to form an active layer and a first transparent layer disposed in a same layer, wherein the first transparent layer is disposed on the substrate corresponding to the display region;
• forming a gate insulating layer on the active layer;
• depositing a layer of metal on the gate insulating layer to form a gate layer;
• depositing and forming an interlayer insulating layer, the active layer, the gate insulating layer, the gate layer, and the first transparent layer on the substrate, and forming at least two first contact holes on the interlayer insulating layer;
• depositing a composite metal layer on the interlayer insulating layer, the composite metal layer comprising a second transparent layer and a metal layer, and etching away the metal layer of the composite metal layer positioned in the display region and retaining the second transparent layer;
• depositing a passivation layer on the interlayer insulating layer and
• the composite metal layer;
• coating a photoresist layer on the passivation layer to form a planarization layer;
• forming a second contact hole by photolithography of the passivation layer and the planarization layer;
• and
• forming a pixel electrode layer on the planarization layer connected to the metal layer through the second contact hole.