Variable graduated capacitor structure and methods for forming the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJheng-Hong Jiang, Shing-Huang Wu, Chia-Wei Liu
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJheng-Hong Jiang, Shing-Huang Wu, Chia-Wei Liu
Estimating the term…
Devices and methods of manufacture for a graduated, “step-like,” capacitance structure having two or more capacitors. A semiconductor structure comprising a capacitor structure, the capacitor structure comprising a first capacitor and a second capacitor. The first capacitor comprising a first bottom electrode and a top electrode having a bottom surface that is a first distance from a top surface of the first bottom electrode. The second capacitor comprising a second bottom electrode and the top electrode, in which the bottom surface is a second distance from a top surface of the second bottom electrode, and in which the first distance is different from the second distance.
A capacitor structure comprising:
A capacitor structure comprising:
A capacitor structure comprising:
Dependencies are inferred from the claim text.