System and methods for controlling an amount of primer in a primer application gas
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorPei-Yi Su
Life of this patent
Estimating the term…
Abstract
A system for controlling an amount of primer in a primer application gas, includes a first sensor for detecting a first content in the primer application gas that is fed into a chamber containing a semiconductor wafer, a second sensor for detecting a second content in an exhaust gas that is exhausted from the chamber, and a flow control device that controls the amount of primer in the primer application gas based on a first sensor signal from the first sensor and a second sensor signal from the second sensor.
Claims20
A system for controlling an amount of primer in a primer application gas, comprising:
- a first sensor for detecting a first content in the primer application gas that is fed into a wafer priming chamber, wherein the primer is applied to a semiconductor wafer in the wafer priming chamber;
- a second sensor for detecting a second content in an exhaust gas that is exhausted from the wafer priming chamber;
- and
- a flow control device that determines an extent of reaction of the primer in the wafer priming chamber based on a first sensor signal from the first sensor and a second sensor signal from the second sensor, and controls the amount of primer in the primer application gas based on the extent of reaction so as to maintain a stable concentration of primer in the wafer priming chamber.
A system for controlling an amount of primer in a primer application gas, comprising:
- a first sensor for detecting an amount of a first component in the primer application gas that is fed into a chamber;
- a second sensor for detecting an amount of a second component in an exhaust gas that is exhausted from the chamber;
- and
- a flow control device that determines a degree of reaction of the primer in the chamber based on a first sensor signal from the first sensor and a second sensor signal from the second sensor, and controls the amount of primer in the primer application gas based on the degree of reaction so as to maintain a stable concentration of primer in the chamber.
A system for controlling an amount of a primer in a primer application gas in an application gas line, comprising:
- a first sensor in the application gas line for detecting an amount of a first component in the primer application gas, wherein the application gas line feeds the primer application gas into a chamber;
- a second sensor for detecting an amount of a second component in an exhaust gas that is exhausted from the chamber;
- and
- a flow control device configured to determine a degree of reaction of the primer in the chamber based on a first sensor signal from the first sensor and a second sensor signal from the second sensor and control a carrier gas flow rate of a carrier gas that carries the primer to the application gas line based on the degree of reaction so as to maintain a stable concentration of primer in the chamber.
Dependencies are inferred from the claim text.