Substrate processing chamber, substrate processing system including the same, and substrate processing method using the same

A substrate processing system comprising:

• a substrate processing chamber;
• a fluid supplying part configured to supply fluid into the substrate processing chamber;
• a drying chamber configured to dry a substrate transferred from the substrate processing chamber;
• a drying fluid supplying part configured to supply a drying fluid into the drying chamber;
• and
• a transfer unit configured to transfer the substrate from the substrate processing chamber to the drying chamber,
• wherein the substrate processing chamber comprises:
• a housing providing a process space;
• a spin apparatus provided in the housing;
• and
• a fluid spraying nozzle configured to spray the fluid into the process space, and
• wherein the spin apparatus comprises:
• a spin chuck configured to support and rotate the substrate;
• and
• a weight sensor configured to measure a weight of the substrate disposed on the spin chuck;
• supporting pins provided on the spin chuck, spaced apart from each other along a circumference of the spin chuck, and in contact with a bottom surface of the substrate;
• and
• fastening pins fastening the substrate disposed on the supporting pins.