Apparatus for thermally processing a substrate
AssigneeUnited Semiconductor (Xiamen) Co., Ltd.
InventorsXin Zhi He, Wen Yi Tan
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Abstract
An apparatus for thermally processing a substrate includes a substrate support for holding the substrate and lamps disposed above the substrate support. The lamps are grouped into concentric lamp zones including a center zone comprised of a center lamp and peripheral lamps surrounding the center lamp. A center sleeve is coupled to the center lamp and peripheral sleeves are coupled to the peripheral lamps, respectively, for directing radiated heat to the substrate during thermal processing. The center sleeve has a higher surface roughness than that of the peripheral sleeves.
Claims8
An apparatus for thermally processing a substrate, comprising:
- a substrate support for holding the substrate;
- a plurality of lamps disposed above the substrate support, wherein the plurality of lamps is grouped into concentric lamp zones including a center zone comprised of a center lamp and peripheral lamps surrounding the center lamp;
- and
- a plurality of reflective sleeves including a center sleeve coupled to the center lamp and peripheral sleeves coupled to the peripheral lamps, respectively, for directing radiated heat to the substrate during thermal processing, wherein the center sleeve has a surface roughness higher than that of the peripheral sleeves.
Dependencies are inferred from the claim text.