Method for enhancing stability of N-type semiconductor through oxygen elimination
AssigneeTianjin University
InventorsLiqiang Li, Liqian Yuan, Yinan Huang, Jinbo He, Wenping Hu
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AssigneeTianjin University
InventorsLiqiang Li, Liqian Yuan, Yinan Huang, Jinbo He, Wenping Hu
Estimating the term…
A method for enhancing the stability of an N-type semiconductor through oxygen elimination includes constructing an antioxidant layer on the surface of a semiconductor material, or blending the antioxidant with the N-type semiconductor material. The antioxidant removes the existing oxygen and related species in the N-type semiconductor, eliminates the related trap state, and prevents the N-type semiconductor from further degrading, so that the electrical properties such as mobility of the N-type semiconductor device are improved, and the operation stability and long-term storage stability are improved. In addition, the antioxidant also inhibits the photobleaching of N-type semiconductors and significantly improves the photochemical stability of N-type semiconductors.
A method for enhancing stability of an N-type semiconductor through oxygen elimination, comprising constructing an antioxidant layer on a surface of the N-type semiconductor by using an antioxidant solution, wherein the antioxidant is one of a metal ion chelating agent, a peroxide decomposer, and an enzyme antioxidant by uniformly coating the solution on a surface of the N-type semiconductor material by dip-coating or drop-casting.
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