Substrate processing apparatus, substrate processing system and substrate processing method

A substrate processing apparatus, comprising:

• a pair of first substrate chucks each configured to hold a substrate from below while allowing a first main surface of the substrate to face upwards;
• a pair of second substrate chucks each configured to hold the substrate from below while allowing a second main surface of the substrate opposite to the first main surface to face upwards;
• a rotary table which holds, around a vertical rotation axis thereof, a first one of the pair of first substrate chucks, a first one of the pair of second substrate chucks, a second one of the pair of first substrate chucks, and a second one of the pair of second substrate chucks in this sequence at a regular distance therebetween, and which is configured to be rotated about the rotation axis;
• a first processing unit equipped with a first processing tool configured to process the first main surface of the substrate held by the first substrate chuck;
• and
• a second processing unit equipped with a second processing tool configured to process the second main surface of the substrate held by the second substrate chuck.