Coating composition for photolithography
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYa-Ting Lin, Yen-Ting Chen, Wei-Han Lai
Life of this patent
Estimating the term…
Abstract
Methods for making a semiconductor device using an improved BARC (bottom anti-reflective coating) are provided herein. The improved BARC comprises a polymer formed from at least a styrene monomer having at least one or two hydrophilic substituents. The monomer(s) and substituents can be varied as desired to obtain a balance between film adhesion and wet etch resistance. Also provided is a semiconductor device produced using such methods.
Claims20
A method for making a semiconductor device, comprising applying a bottom anti-reflective coating composition upon a surface of a substrate, wherein the coating composition comprises a polymer that includes a repeating unit of Formula (I) derived from a styrene monomer:
- wherein each X is a hydrophilic substituent independently selected from the group consisting of —NH2, —NHR, —NR2, —SH, —(C═O)H, —(C═O)R, —CO—NR2, —NR—(C═O)R, —SO3, —SO4, and —PO4, and salts and protected substituents thereof, wherein R is independently hydrogen, alkyl, alkenyl, alkynyl, or aryl;
- and
- where y is 2 to 5;
- and
- a crosslinker.
A method of making a semiconductor device, comprising
- applying a bottom anti-reflective coating (BARC) layer upon a surface, wherein the BARC layer comprises a polymer that includes a repeating unit of Formula (I) derived from a styrene monomer:
- wherein each X is a hydrophilic substituent independently selected from the group consisting of —NH2, —NHR, —NR2, —SH, —(C═O)H, —(C═O)R, —CO—NR2, —NR—(C═O)R, —SO3, —SO4, and —PO4, and salts and protected substituents thereof, wherein R is independently hydrogen, alkyl, alkenyl, alkynyl, or aryl;
- and wherein y is 2 to 5;
- applying a photoresist layer upon the BARC layer;
- forming a masking pattern in the photoresist layer;
- and
- transferring the masking pattern to the BARC layer by etching.
A bottom anti-reflective coating (BARC) composition, comprising:
- a polymer that includes a repeating unit of Formula (I) derived from a styrene monomer:
- wherein each X is a hydrophilic substituent independently selected from the group consisting of —NH2, —NHR, —NR2, —SH, —(C═O)H, —(C═O)R, —CO—NR2, —NR—(C═O)R, —SO3, —SO4, and —PO4, and salts and protected substituents thereof, wherein R is independently hydrogen, alkyl, alkenyl, alkynyl, or aryl;
- and
- wherein y is 2 to 5;
- and
- a crosslinker.
Dependencies are inferred from the claim text.