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US 12,191,139 B2Granted
Selective molecular layer deposition of organic and hybrid organic-inorganic layers
AssigneeApplied Materials, Inc.
InventorsTapash Chakraborty, Robert Jan Visser, Prerna Goradia
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Abstract
Embodiments of the disclosure relate to methods of selectively depositing organic and hybrid organic/inorganic layers. More particularly, embodiments of the disclosure are directed to methods of modifying hydroxyl terminated surfaces for selective deposition of molecular layer organic and hybrid organic/inorganic films. Additional embodiments of the disclosure relate to cyclic compounds for use in molecular layer deposition processes.
Claims8
A method of depositing a film comprising:
- providing a substrate comprising a first material having a hydrogen terminated surface and a second material having a hydroxyl terminated surface;
- exposing the substrate to a modifying compound comprising a modifying species that reacts with the hydroxyl terminated surface of the second material to form a modified second surface on the second material;
- and
- exposing the substrate to one or more deposition gases which react with the modified second surface of the second material to form a film on the second material,
- wherein the modifying species has a general formula (RO)3Si-L-Si(OR)3 where each R is independently selected from C1-C4 alkyl groups and L is an aromatic moiety or a carbon chain comprising 1 to 3 carbon atoms.
2 more elements
Dependencies are inferred from the claim text.