Movable magnet array for magnetron sputtering
AssigneeIntellivation LLC
InventorsMichael G. Simmons, Joshua D. Misek, Mark George
Life of this patent
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AssigneeIntellivation LLC
InventorsMichael G. Simmons, Joshua D. Misek, Mark George
Estimating the term…
An apparatus for sputtering target material onto a substrate based on a plasma confining racetrack having two parallel straight portions and two turnaround portions includes a tubular target, an elongated magnet array, and a drive mechanism. The tubular target has two ends in proximity to the two turnaround portions and a longitudinal axis about which the target is rotatable. The magnet array is supported within the target to generate a plasma-confining magnetic field. The array includes a central stationary portion of magnets and two axially movable shunts positioned at the ends of the stationary portion. Each shunt carries a magnet segment configured to slidably extend from each end of the stationary portion to define a gap. The gaps are positioned internal to the turnaround portions. The drive mechanism axially moves the shunts parallel to the longitudinal axis of the target to vary a width of the gaps.
An apparatus for sputtering target material onto a substrate based on a plasma confining racetrack having two parallel straight portions and two turnaround portions connecting the two parallel straight portions at ends thereof, said apparatus comprising:
Dependencies are inferred from the claim text.