System and method for defect inspection using voltage contrast in a charged particle system

A non-transitory computer readable medium that stores a set of instructions that is executable by at least one processor of a computing device to cause the computing device to perform a method for generating a plurality of beams for inspecting a wafer positioned on a stage, the method comprising:

• positioning the stage at a first position to enable a first beam of the plurality of beams to scan a first surface area of the wafer at a first time to generate a first image associated with the first surface area;
• positioning the stage at a second position to enable a second beam of the plurality of beams to scan the first surface area at a second time to generate a second image associated with the first surface area;
• and
• comparing the first image with the second image to enable detecting whether a defect is identified in the first surface area of the wafer.