Integrated circuit structure
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorJhon-Jhy Liaw
Life of this patent
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorJhon-Jhy Liaw
Estimating the term…
An IC structure includes a plurality of first fins, a plurality of second fins, a plurality of first gate structures, a plurality of second gate structures, and a first gate contact. The first fins and the second fins are over a substrate. The first gate structures traverse the plurality of first fins. The second gate structures traverse the plurality of second fins. The first gate structures have a first gate pitch. The second gate structures have a second gate pitch wider than the first gate pitch. The first gate contact is over a first one of the second gate structures. The first gate contact overlaps a location where the first one of the second gate structures traverses across a first one of the second fins.
An integrated circuit (IC) structure, comprising:
An IC structure, comprising:
An IC structure, comprising:
Dependencies are inferred from the claim text.