Substrate processing system and substrate processing method

A substrate processing system comprising:

• a loading/unloading part into and from which a cassette that accommodates a plurality of substrates is loaded and unloaded respectively;
• a batch-type processing part configured to collectively process a lot including the plurality of substrates, and including a processing bath that stores a processing solution in a lump form or a mist form;
• a single-substrate-type processing part configured to process the plurality of substrates of the lot one by one;
• an interface part configured to deliver the plurality of substrates between the batch-type processing part and the single-substrate-type processing part, and including:
• a lot formation part configured to form the lot;
• and
• a transfer part configured to transfer the plurality of substrates from the single-substrate-type processing part to the lot formation part, and configured to transfer the plurality of substrates, which are wet with the processing solution, directly to the single-substrate-type processing part from the processing solution in the processing bath of the batch-type processing part;
• and
• a controller configured to control the transfer part to execute a process including:
• transferring the plurality of substrates from the loading/unloading part to the interface part, then to the batch-type processing part, then to the single-substrate-type processing part, and then to the loading/unloading part,
• wherein the loading/unloading part, the single-substrate-type processing part, the interface part, and the batch-type processing part are arranged in this order, and
• wherein, in the transferring the plurality of substrates from the batch-type processing part to the single-substrate-type processing part, the controller is further configured to control the transfer part to take out the plurality of substrates, which are wet with the processing solution, from the processing bath and then directly transfer the plurality of substrates taken out from the processing bath to the single-substrate-type processing part.