Substrate treatment device and substrate treatment method

A substrate treatment device configured to perform etching on a substrate, comprising:

• a chamber having a treatment space therein;
• a substrate holder configured to hold the substrate in a predetermined position in the chamber;
• a nozzle configured to supply an etching solution to the substrate held by the substrate holder, in relation to an etching amount associated with the substrate;
• a spin motor configured to rotate the substrate holder about a predetermined rotation axis;
• a thermographic camera configured to acquire a temperature distribution in a peripheral area around a substrate area occupied by the substrate when arranged at the predetermined position in the chamber;
• and
• a controller configured to:
• a) cause the substrate holder to hold the substrate in the predetermined position in the chamber;
• b) cause the substrate holder to rotate the substrate in the predetermined position about a rotation axis;
• c) cause the nozzle to supply the etching solution to a surface of the substrate;
• d) cause the thermographic camera to acquire the temperature distribution in an upper surface of the substrate holder and a peripheral area around the substrate area occupied by the substrate when arranged at the predetermined position in the chamber;
• e) calculate a feature value for evaluation of an etching treatment to be used in the supplying of the etching solution from the temperature distribution acquired by the thermographic camera;
• f) determine if the feature value exceeds a threshold value;
• and
• g) change a schedule that defines a time for the substrate to be carried into the chamber;
• wherein if the feature value exceeds the threshold value, the schedule is changed so that the substrate is not transferred into the chamber;
• and
• wherein the thermographic camera is configured to image an imaging area that includes the upper surface of the substrate holder, the peripheral area and an area where the substrate held on the substrate holder is arranged, and the temperature distribution being provided in the form of a thermography.