Substrate processing apparatus

A substrate processing apparatus comprising:

• a chamber which has a processing room in which a substrate is processed;
• a cover which is provided in the processing room and is provided in a place between the substrate and the chamber;
• and
• a heater which is provided only on the cover and the heater heats the cover,
• wherein the cover has an upper structure and a lower structure
• the upper structure includes a first top wall that faces an upper surface of the substrate, a second top wall that faces the first top wall, a top wall side connecting member that connects the first top wall and the second top wall to each other, and an upper space that is a space between the first top wall, the second top wall, and the top wall side connecting member,
• the lower structure includes a first peripheral wall that surrounds an outer periphery of the substrate, a second peripheral wall that surrounds an outer periphery of the first peripheral wall, a pair of peripheral wall side connecting members that connect the first peripheral wall and the second peripheral wall to each other, and an lower space is a space between the first peripheral wall, the second peripheral wall, and the pair of peripheral wall side connecting members;
• wherein the upper space and the lower space, in which atmospheric pressure can be maintained, and
• wherein the heater is provided in the upper space and lower space,
• wherein the second top wall is provided at a distance from a chamber upper wall,
• wherein the second peripheral wall is provided at a distance from a chamber peripheral wall,
• wherein a space between the cover and the chamber is evacuated.