Resist composition and resist pattern forming method

A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed due to an action of the acid, the resist composition comprising:

• a base material component (A) whose solubility in a developing solution is changed due to the action of an acid;
• an acid generator component (B) which generates an acid upon light exposure;
• and
• a mixed solvent(S) comprising methyl 2-hydroxyisobutyrate in a range of 10% by weight to 30% by weight,
• wherein the acid generator component (B) contains a compound (B1) represented by Formula (b1),
• wherein Rb1 represents an aryl group which may have a substituent, Rb2 and Rb3 each independently represents an aliphatic hydrocarbon group, Rb2 and Rb3 may be bonded to each other to form a ring structure, Lb1, Lb2, and Lb3 each independently represents a divalent linking group or a single bond, and X− represents a counter anion.